ABSTRACT
A novel 1200 V 4H-SiC junction barrier Schottky diode (JBS) with built-in MOSFET(MJBS) structure is proposed and simulated with Sentaurus TCAD. The characteristics of forward conduction and reverse blocking of conventional JBS and proposed MJBS with different channel widths are investigated. The MJBS exhibits a lower forward voltage drop and better reverse breakdown characteristics than that of the JBS, which attributes to high-reliability applications. In addition, a local heavy doping concentration is adopted in MOSFET channel region, which can reduce the on-state resistance of the gate accumulation layer and reduce the possibility of early device breakdown due to the increase of channel doping concentration.
- L. Lorenz, "Power Semiconductor Devices-Development Trends and System Interactions," 2007 Power Conversion Conference - Nagoya, Nagoya, 2007, pp. 348--354, doi: 10.1109/PCCON.2007.372991.Google ScholarCross Ref
- H. Okumura, "Power electronics innovation by Silicon Carbide power semiconductor devices," 2014 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK), Kyoto, 2014, pp. 1--2, doi: 10.1109/IMFEDK.2014.6867086.Google Scholar
- K. Domasevich, V. Nelayev, V. Solodukha and A. Turtsevich, "Comparative analysis of modern schottky diode structures. Design and application issues," 2013 12th International Conference on the Experience of Designing and Application of CAD Systems in Microelectronics (CADSM), Polyana Svalyava, 2013, pp. 84--86.Google Scholar
- Nuruzzaman M, Islam M A, Alam M A, et al. Structural, elastic and electronic properties of 2H- and 4H-SiC[J]. International Journal of Engineering Research and Applications, 2015.Google Scholar
- Dahlquist F, Svedberg J O, Zetterling C M, et al. A 2.8kV, Forward Drop JBS Diode with Low Leakage[J]. Mater Sci Forum, 2000.Google Scholar
- Hull, B. A, Sumakeris, et al. Performance and Stability of Large-Area 4H-SiC 10-kV Junction Barrier Schottky Rectifiers[J]. IEEE Transactions on Electron Devices, 2008.Google ScholarCross Ref
- Z. Xu, B. Zhang and A. Q. Huang. Experimental demonstration of the MOS controlled diode (MCD)[C]. Fifteenth Annual IEEE Applied Power Electronics Conference and Exposition (Cat. No.00CH37058), New Orleans, LA, USA, 2000, pp. 1144--1148 vol.2.Google ScholarCross Ref
- S. E. D. Habib. The ALDMOST: A new power MOS transistor[J]. IEEE Letters on Electron Devices, 1987, 8(6): 257--259.Google ScholarCross Ref
- K. Chatty, T. P. Chow, R. J. Gutmann, E. Arnold and D. Alok. Accumulation-layer electron mobility in n-channel 4H-SiC MOSFETs[J]. IEEE Electron Device Letters, May 2001, vol. 22, no. 5, pp. 212--214.Google Scholar
- J. Tan, J. A. Cooper and M. R. Melloch. High-voltage accumulation-layer UMOSFETs in 4H-SiC[C]. 56th Annual Device Research Conference Digest (Cat. No.98TH8373), Charlottesville, VA, USA, 1998, pp. 88--89.Google ScholarCross Ref
- W. Sung, K. Han and B. J. Baliga.A comparative study of channel designs for SiC MOSFETs: Accumulation mode channel vs. inversion mode channe[C]. 2017 29th International Symposium on Power Semiconductor Devices and IC's (ISPSD), Sapporo, 2017, pp. 375--378.Google ScholarCross Ref
- X. Luo and A. Q. Huang, Design and Simulation of 600V 4H-SiC Superjunction JBS Diode[C]. 2019 IEEE 7th Workshop on Wide Bandgap Power Devices and Applications (WiPDA), Raleigh, NC, USA, 2019, pp. 121--124.Google ScholarCross Ref
- M. M. Islam and K. Das. Effects of surface/interface states on Schottky contacts for 4H-SiC[C]. Proceedings of the Thirty-Seventh Southeastern Symposium on System Theory, 2005. SSST '05., Tuskegee, AL, USA, 2005, pp. 37.Google ScholarCross Ref
- Xintian, Zhou, Ruifeng, et al. 4H-SiC Trench MOSFET With Floating/Grounded Junction Barrier-controlled Gate Structure[J]. IEEE Transactions on Electron Devices, 2017, 64(11):4568--4574.Google ScholarCross Ref
- Zhang M, Wei J, Jiang H, et al. SiC trench MOSFET with self-biased p-shield for low RON-SP and low OFF-state oxide field[J]. IET Power Electronics, 2017.Google Scholar
Index Terms
- Investigation of 1200 V 4H-SiC Junction Barrier Schottky Diode with Built-in MOSFET
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