research-article

AdaOPC: A Self-Adaptive Mask Optimization Framework for Real Design Patterns

Authors:

Martin D. F. WongAuthors Info & Claims

ICCAD '22: Proceedings of the 41st IEEE/ACM International Conference on Computer-Aided Design

Article No.: 123, Pages 1 - 9

https://doi.org/10.1145/3508352.3549468

Published: 22 December 2022 Publication History

Abstract

Optical proximity correction (OPC) is a widely-used resolution enhancement technique (RET) for printability optimization. Recently, rigorous numerical optimization and fast machine learning are the research focus of OPC in both academia and industry, each of which complements the other in terms of robustness or efficiency. We inspect the pattern distribution on a design layer and find that different sub-regions have different pattern complexity. Besides, we also find that many patterns repetitively appear in the design layout, and these patterns may possibly share optimized masks. We exploit these properties and propose a self-adaptive OPC framework to improve efficiency. Firstly we choose different OPC solvers adaptively for patterns of different complexity from an extensible solver pool to reach a speed/accuracy co-optimization. Apart from that, we prove the feasibility of reusing optimized masks for repeated patterns and hence, build a graph-based dynamic pattern library reusing stored masks to further speed up the OPC flow. Experimental results show that our framework achieves substantial improvement in both performance and efficiency.

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Cited By

Yang HRen HSalakhutdinov RKolter ZHeller KWeller AOliver NScarlett JBerkenkamp F(2024)ILILTProceedings of the 41st International Conference on Machine Learning10.5555/3692070.3694394(56319-56331)Online publication date: 21-Jul-2024
https://dl.acm.org/doi/10.5555/3692070.3694394
Zheng SMa YYu BWong MDe V(2024)EMOGen: Enhancing Mask Optimization via Pattern GenerationProceedings of the 61st ACM/IEEE Design Automation Conference10.1145/3649329.3655680(1-6)Online publication date: 23-Jun-2024
https://dl.acm.org/doi/10.1145/3649329.3655680
Yin SZhao WXie LChen HMa YHo TYu BHui-Ru Jiang IPosser G(2024)FuILT: Full Chip ILT System With Boundary HealingProceedings of the 2024 International Symposium on Physical Design10.1145/3626184.3633315(13-20)Online publication date: 12-Mar-2024
https://dl.acm.org/doi/10.1145/3626184.3633315
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Index Terms

AdaOPC: A Self-Adaptive Mask Optimization Framework for Real Design Patterns
1. Computing methodologies
  1. Computer graphics
    1. Image manipulation
      1. Antialiasing
    2. Rendering
      1. Rasterization
2. Hardware

Index terms have been assigned to the content through auto-classification.

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cover image ACM Conferences

ICCAD '22: Proceedings of the 41st IEEE/ACM International Conference on Computer-Aided Design

October 2022

1467 pages

ISBN:9781450392174

DOI:10.1145/3508352

Conference Chair:
Tulika Mitra
National University of Singapore
,
Program Chairs:
Evangeline Young
The Chinese University of Hong Kong
,
Jinjun Xiong
University at Buffalo (UB)

Copyright © 2022 ACM.

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New York, NY, United States

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Published: 22 December 2022

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ICCAD '22: IEEE/ACM International Conference on Computer-Aided Design

October 30 - November 3, 2022

California, San Diego

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Cited By

Yang HRen HSalakhutdinov RKolter ZHeller KWeller AOliver NScarlett JBerkenkamp F(2024)ILILTProceedings of the 41st International Conference on Machine Learning10.5555/3692070.3694394(56319-56331)Online publication date: 21-Jul-2024
https://dl.acm.org/doi/10.5555/3692070.3694394
Zheng SMa YYu BWong MDe V(2024)EMOGen: Enhancing Mask Optimization via Pattern GenerationProceedings of the 61st ACM/IEEE Design Automation Conference10.1145/3649329.3655680(1-6)Online publication date: 23-Jun-2024
https://dl.acm.org/doi/10.1145/3649329.3655680
Yin SZhao WXie LChen HMa YHo TYu BHui-Ru Jiang IPosser G(2024)FuILT: Full Chip ILT System With Boundary HealingProceedings of the 2024 International Symposium on Physical Design10.1145/3626184.3633315(13-20)Online publication date: 12-Mar-2024
https://dl.acm.org/doi/10.1145/3626184.3633315
Zheng SXiao GYan GDong MLi YChen HMa YYu BWong M(2024)Model-based OPC Extension in OpenILT2024 2nd International Symposium of Electronics Design Automation (ISEDA)10.1109/ISEDA62518.2024.10617951(568-573)Online publication date: 10-May-2024
https://doi.org/10.1109/ISEDA62518.2024.10617951
Zheng SYang HZhu BYu BWong MOh ANaumann TGloberson ASaenko KHardt MLevine S(2023)LithoBenchProceedings of the 37th International Conference on Neural Information Processing Systems10.5555/3666122.3667437(30243-30254)Online publication date: 10-Dec-2023
https://dl.acm.org/doi/10.5555/3666122.3667437
Yu B(2023)Machine Learning in EDA: When and How2023 ACM/IEEE 5th Workshop on Machine Learning for CAD (MLCAD)10.1109/MLCAD58807.2023.10299822(1-6)Online publication date: 10-Sep-2023
https://doi.org/10.1109/MLCAD58807.2023.10299822
Pei ZZhao WHe ZYu B(2023)Bit-Level Quantization for Efficient Layout Hotspot Detection2023 International Symposium of Electronics Design Automation (ISEDA)10.1109/ISEDA59274.2023.10218502(465-470)Online publication date: 8-May-2023
https://doi.org/10.1109/ISEDA59274.2023.10218502
Zheng SYu BWong M(2023)OpenILT: An Open Source Inverse Lithography Technique Framework (Invited Paper)2023 IEEE 15th International Conference on ASIC (ASICON)10.1109/ASICON58565.2023.10396314(1-4)Online publication date: 24-Oct-2023
https://doi.org/10.1109/ASICON58565.2023.10396314

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