ABSTRACT
In chip fabrication, spinner equipment is used for many steps such as creating a uniform layer of photo-resist or etching solvent over wafer. Spinner equipment works by rotating wafer at high speed (∼ 0.1 - 1 kHz) after depositing liquid solvent over wafer. The rotation causes solvent to distribute uniformly over wafer under ideal conditions. Due to impurities and rough terrain (chip layout), the spread is non-uniform. This results in spatially inconsistent chemical processing even though same pattern is printed throughout wafer. Process defects arise due to this non-uniformity. Currently, wafer inspection is done post the spinner process completion. Even though the spinner step is crucial, efficient real time quality tracking and in-line process control methods do not exist. In this paper, we present a novel hardware setup and corresponding software algorithm which makes the spinner track its process and dynamically adjust processing parameters (e.g. speed of rotation, tilt etc.) in order to improve the spread uniformity. We perform theoretical modelling of proposed novel hardware setup and present simulation result to prove its feasibility.
- E. Porat and A. Rothschild, Explicit Non-adaptive Combinatorial Group Testing Schemes, In Proceedings of the 35th International colloquium on Automata, Languages and Programming – Vol. Part I (ICALP). Springer-Verlag, Berlin, Heidelberg (2008), 748–759.Google ScholarDigital Library
- Yan Yang, Jian Sun , Deep ADMM-Net for Compressive Sensing MRI,” Advances in NeurIPS, Vol. 29 (2016).Google Scholar
- Shi-Qiang Li, Xuewu Xu , “Phase-only transmissive spatial light modulator based on tunable dielectric metasurface,” Science, Vol. 364, Issue 6445 (June 2019), 1087-1090.Google ScholarCross Ref
- Cheng Peng , “Design of high-speed phase-only spatial light modulators with two-dimensional tunable microcavity arrays,” Optics Express 27, Vol. 27, Issue 21 (Oct. 2019), 30669-30680.Google ScholarCross Ref
- Vocal Technologies, Single Pixel Camera, Compressed Sensing, Vocal Technologies. Retrieved Oct 18, 2021 from https://www.vocal.com/compressed-sensing/single-pixel-camera/.Google Scholar
- Wikipedia, Spin Coating, Wikipedia. Retrieved Oct 18, 2021 from https://en.wikipedia.org/wiki/Spin_coatingGoogle Scholar
- S. Foucart and H. Rauhut. 2013. A Mathematical Introduction to Compressive Sensing, Birkhäuser Basel.Google Scholar
- Sharan Vaswani, Automatic Algorithm Configuration for Compressive. Sensing, Computer Science Department, University of British Columb. Retrieved Oct 18, 2021 from https://vaswanis.github.io/ml_opti_report.pdf.Google Scholar
- Sudha Hanumanthu et.al, Universal Measurement Matrix Design for Sparse and Co-Sparse Signal Recovery, Turkish Journal of Computer and Mathematics Education (TURCOMAT), Vol. 12, No. 6 (April 2021), 404-411Google Scholar
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