A novel scheme to developing printing protocol with the required surface roughness
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- A novel scheme to developing printing protocol with the required surface roughness
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Evaluation of surface roughness of ULE® substrates machined by Ar+ ion beam
Ion beam figuring is suitable for the final correction of the surface figure error of aspherical substrates in an extreme ultraviolet lithography optics. This paper reports the investigation of the surface roughness of ULE^(R) substrate machined by an ...
Low energy Xe+ ion beam machining of ULE® substrates for EUVL projection optics - Evaluation of high-spatial frequency roughness
Ion beam figuring (IBF) is a suitable technology for the final shape correction of substrates used in the projection optics of EUVL tools. In order to achieve HSFR below 0.10nm rms, we have conducted our research on ion beam machining of the ULE(R) ...
Evaluation of surface roughness of ULE® substrates machined by Ar+ ion beam
Ion beam figuring is suitable for the final correction of the surface figure error of aspherical substrates in an extreme ultraviolet lithography optics. This paper reports the investigation of the surface roughness of ULE substrate machined by an Ar+ ...
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Association for Computing Machinery
New York, NY, United States
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- Short-paper
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- the Special plan of the National key R&D Program of international cooperation in science and technology innovation between governments
- the Key projects of science and technology plan of the Beijing Municipal Commission of Education
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