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AI for Materials Innovation: Self-Improving Photosensitizer Discovery System via Bayesian Search with First-Principles Simulation

Published:13 May 2024Publication History

ABSTRACT

Artificial intelligence (AI) based self-learning or self-improving material discovery systems will enable next-generation material discovery. Herein, we demonstrate how to combine accurate prediction of material performance via first-principles calculation and Bayesian optimization-based active learning to realize a self-improving discovery system for high-performance photosensitizers (PSs). Through self-improving cycles, such a system can improve the model prediction accuracy (best mean absolute error of 0.090 eV for singlet--triplet spitting) and high-performance PS search ability, realizing efficient discovery of PSs. From a molecular space with more than 7 million molecules, 5357 potential high-performance PSs were discovered. Four PSs were further synthesized to show performance comparable with or superior to commercial ones. This work highlights the potential of active learning in first principle-based materials design, and the discovered structures could boost the development of photosensitization-related applications, which is one of the typical examples of how AI can be used to accelerate materials innovation and facilitate science development in general.

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  1. AI for Materials Innovation: Self-Improving Photosensitizer Discovery System via Bayesian Search with First-Principles Simulation

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      • Published in

        cover image ACM Conferences
        WWW '24: Proceedings of the ACM on Web Conference 2024
        May 2024
        4826 pages
        ISBN:9798400701719
        DOI:10.1145/3589334

        Copyright © 2024 Owner/Author

        Permission to make digital or hard copies of part or all of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for third-party components of this work must be honored. For all other uses, contact the Owner/Author.

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        Association for Computing Machinery

        New York, NY, United States

        Publication History

        • Published: 13 May 2024

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        Overall Acceptance Rate1,899of8,196submissions,23%
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