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Intercircuit: Electroplating with Cavities for Fast Fabrication of Complex and High-Performance 3D Circuits

Published: 11 May 2024 Publication History

Abstract

In Human-Computer Interaction, multi-material 3D printing is increasingly recognized for its capacity to produce conductive interactive objects. While various fabrication techniques have emerged in this domain, achieving the integration of highly conductive 3D structures within printed objects continues to pose a significant technical hurdle. Our study introduces Intercircuit, a novel integrated technique developed explicitly for fabricating highly conductive interactive objects. This method employs multi-material printing to form unified components along with their embedded structures of lower conductivity, enhancing conductivity through targeted plating. Distinct from traditional multi-material printing and surface conductivity augmentation methods, the Intercircuit method facilitates the creation of complex 3D circuitry while ensuring superior conductivity. Furthermore, this study introduces a supportive design tool aimed at aiding users in crafting conductive frameworks. Moreover, the practical application of this method is further elucidated through a series of case studies.

Supplemental Material

MP4 File - Video Preview
Video Preview
Transcript for: Video Preview
ZIP File - Design Tool
The submitted file is used to build the paper's DESIGN INTERFACE of the grasshopper file, which can quickly build the conducting lines and cavern structure.

References

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  1. Intercircuit: Electroplating with Cavities for Fast Fabrication of Complex and High-Performance 3D Circuits

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    cover image ACM Conferences
    CHI EA '24: Extended Abstracts of the CHI Conference on Human Factors in Computing Systems
    May 2024
    4761 pages
    ISBN:9798400703317
    DOI:10.1145/3613905
    Permission to make digital or hard copies of part or all of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for third-party components of this work must be honored. For all other uses, contact the Owner/Author.

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    New York, NY, United States

    Publication History

    Published: 11 May 2024

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    Author Tags

    1. 3D printed electronics;Selective Electroplating
    2. conductive filament;

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    • Work in progress
    • Research
    • Refereed limited

    Funding Sources

    • Fundamental Research Funds for the Central Universi-ties, the Engineering Research Center of Computer-Aided Product Innovation Design Min-istry of Education, National Natural Science Foundation of China (Grant No. 52075478), and National Social Science Foundation of China (Grant No. 21AZD056).

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    CHI '24

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    Overall Acceptance Rate 6,164 of 23,696 submissions, 26%

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    CHI 2025
    ACM CHI Conference on Human Factors in Computing Systems
    April 26 - May 1, 2025
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