Intercircuit: Electroplating with Cavities for Fast Fabrication of Complex and High-Performance 3D Circuits
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- Intercircuit: Electroplating with Cavities for Fast Fabrication of Complex and High-Performance 3D Circuits
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Association for Computing Machinery
New York, NY, United States
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- Fundamental Research Funds for the Central Universi-ties, the Engineering Research Center of Computer-Aided Product Innovation Design Min-istry of Education, National Natural Science Foundation of China (Grant No. 52075478), and National Social Science Foundation of China (Grant No. 21AZD056).
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